Organotin cluster photoresists and stabilization methods

Inventor: Feng Lu

Patent Publication Number: US 20240353752 A1

Publication date: 2024-10-24

Access Link: USPTO

Abstract

The present disclosure is related to organotin cluster photoresists and stabilization methods, particularly for extreme ultraviolet radiation (EUV) photolithography. The organotin cluster photoresists comprise one or more represented by chemical formulas [RR¹Sn]E, and [RSn]E. The stabilization methods include the application of organic molecules as additives to stabilize organotin cluster photoresists.