Organotin photoresist composition and method of stabilization

Inventor: Feng Lu

Patent Publication Number: US 20240377729 A1

Publication date: 2024-11-14

Access Link: USPTO

Patent Publication Number: WO2024233871 A1

Publication date: 2024-11-14

Access Link: WIPO

Abstract

An organotin photoresist composition for actinic radiation and a method of stabilization are described. The organotin photoresist composition comprises an organotin compound represented by chemical formulas [RSnOO]4Sn, [RSnOO]3SnR1, [RSnOO]2SnR12, [RSnOO]SnR13, [R3SnO]4Sn, [R3SnO]3SnR1, [R3SnO]2SnR12, [R3SnO]SnR13, or R2Sn(µ-O)2Sn(µ-O)2SnR2, a solvent and an additive, wherein R, R1 are each independently a substituted or unsubstituted alkyl, alkenyl, alkynyl, cycloalkyl, or cycloalkenyl group with 1 to 20 carbon atoms, or a substituted or unsubstituted aryl group with 6-20 carbon atoms, or an amine, cyclic amine, cyano, ether, cyclic ether, ester, cyclic ester, halide, nitro, silyl, thiol, or carbonyl group. A method of stabilization of organotin photoresist composition comprises adding an organic additive.