Organotin photoresist composition and method of stabilization

Inventor: Feng Lu

Patent Publication Number: US 20250053085 A1

Publication date: 2025-02-13

Access Link: USPTO

Patent Publication Number: WO2025038394 A2

Publication date: 2025-02-20

Access Link: WIPO

Abstract

An organotin photoresist composition and a method of stabilization are described. The organotin photoresist composition comprises a (stannocenyl)tin compound, a solvent, and an additive. Stannocenyl includes bis(cyclopentadienyl)tin, or substituted bis(cyclopentadienyl)tin, wherein cyclopentadienyl comprises cyclopentadienyl C5H5 group, or substituted cyclopentadienyl C5H4R, C5H3R2, C5H2R3, C5HR4, or C5R5 group. A method of stabilization comprises the usage of organic molecules as additives to stabilize (stannocenyl)tin compound photoresists.